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ALD Technology
Atomic Layer Deposition (ALD), used to deposit films on a monolayer scale, has become widely adopted in R&D and various industries…..
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Corial Plasma Therm – Corial 200FA RIE Etch system
The Corial 200FA combines the advantages of high rates with low cost of ownership for IC failure analysis applications….
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Corial Plasma Therm – Corial 200I ICP-RIE etch system
The Corial 200R is a compact, easy-to-use system for reactive ion etching of silicon-based compounds, metals and polymers…..
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Corial Plasma Therm – Corial 200S RIE etch system
This simple-to-use, manually-loaded RIE system can etch a wide range of materials including silicon, silicon-based compounds, metals, and polymers with fluorinated gases….
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Corial Plasma Therm – Corial 210D ICP-CVD system
The Corial 210D ICP-CVD system is ideal for R&D centers, and offers a wide range of applications for the specialty semiconductor markets….
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Corial Plasma Therm – Corial 210IL ICP-RIE etch system
The Corial 210D ICP-CVD system is ideal for R&D centers, and offers a wide range of applications for the specialty semiconductor markets….
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Corial Plasma Therm – Corial 210RL RIE etch system
The Corial 210RL offers a flexible solution for reactive ion etching of wafer pieces, or up to full 200 mm wafers….
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Corial Plasma Therm – Corial 300S RIE etch system
With chrome and quartz etch capabilities, the Corial 300S RIE system is ideal for mask repair. This product can process….
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Corial Plasma Therm – Corial 360IL ICP-RIE etch system
Light up the world with the ICP-RIE equipment offering industry-leading uniformity and repeatability for PSS applications
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Corial Plasma Therm – Corial 360RL RIE etch system
With chrome and quartz etch capabilities, the Corial 360RL RIE system is ideally suited for mask repair. This product can….
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Corial Plasma Therm – Corial D250L PECVD system
The Corial D250L PECVD tool is designed for low volume production over a wide range of applications for specialty semiconductor markets…..
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