A electron beam source with the Arc Free option is ideal for many applications, such as for optical coating and for ion plating without a pressure barrier. The reduction in arcing results in improved film quality, improved yields, and fewer….

For applications requiring large evaporation materials inventory (e.g. multiple or thick layers, extended throw distances) the Model 295 Source provides a wide range of crucible sizes including 6x 100cc, 16x 15cc, 10x 40cc, and a 1486cc trough. The Model 298 electron beam….