CF150, CF200 rectangle UHV chamber

In stock


Surface treatment: electro-polishing

Specification:CF150、CF200 rectangle UHV chamber

Leak rate<2 x10-10mbar.l/sec

Operation Pressure<7.5×10-10torr

When the total pressure is below 1 x10-9 torr, partial pressure of above 45amu is <0.1%.

RGA detection and analysis

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